Why Shop Salem?
Politex can be used with colloidal silica, cerium oxide and submicron alumina.
Politex polishing pads are classic CMP finishing pads. They are manufactured from proprietary polyurethane and incorporate a unique, vertically oriented pore structure with a compressible substrate. The substrate is designed to instantaneously recover from polishing compression, creating a pumping action that enhances slurry flow within the pad to produce optimum surface finish quality. This attribute reduces pad loading and increases pad life, which is well suited for final polishing of silicon, oxide, glass or metals. This product is offered as roll goods 54" wide and sold by the inch.
